Research Article Open Access

Influence of oxygen partial pressure and annealing temperature on the physical properties of nanostructured ZnO thin films prepared by RF magnetron sputtering

 

R. Subba Reddy1, S. Uthanna1, A. Sivasankar Reddy2, T. Srikanth2,  B. Radha Krishna3

 

 

1Department of Physics, Sri Venkateswara University, Tirupati 517 502, India

2Department of Physics, Vikrama Simhapuri University PG Center, Kavli 524 201, India

3Department of Physics, NBKR Institute of Science and Technology, Vidyanagar 524413, India

Adv. Mater. Proc., 2018, 3 (9), 570-576

DOI:

Publication Date (Web):05 November 2018

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