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Research Article Open Access

Comparative study of Co2MnSi structural and surface morphological thin films on Si/SiO2

Rashmi Singh1, Puneet Jain1, Naresh Kumar2, Rachana Kumar3, Pramod Kumar1*

1Magnetic and Spintronics Laboratory, Department of Applied Science,

Indian Institute of Information Technology Allahabad, Allahabad 211012, India

2Department of Physics, Motilal Nehru National Institute of Technology Allahabad 211004, India

3National Physical Laboratory, New Delhi 110012, India

Adv. Mater. Proc., 2017, 2 (2), 76-79

DOI: 10.5185/amp.2017/203

Publication Date (Web):05 February 2017

Copyright © IAAM-VBRI Press

Abstract


Abstract

Thin films of Co2MnSi are grown on n-doped Si (100) and SiO2 (100) substrates by RF sputtering. The deposition time to grow the films is varied, once for ten minutes and another for an hour at a particular substrate temperature 600oC and keeping all the other parameters same. The Co2MnSi thin films deposited on Si and SiO2 are crystalline irrespective of the deposition time. The grains were round in the thin films deposited for 10 minutes and these grains are more consistently interconnected in the films deposited for 1 hour. This is supported by the surface roughness data from AFM. The rms roughness is found to be 4.82nm for Si for 10 minutes and 2.50nm for Si for 1 hour deposition that was observed over an area of 3µm2. Copyright © 2017 VBRI Press.

Keywords


Heusler alloy, half-metallic ferro-magnets, Co2MnSi, thin films, RF sputtering, XRD, AFM.