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Research Article Open Access

Electron-beam Deposition of Ceramic Coatings

 

E.M. Oks1,2, A.V. Tyunkov1,2, Yu.G. Yushkov1,2*, D.B. Zolotukhin1

 

1Department of Physics, Tomsk State University of Control Systems and Radioelectronics, 40 Lenina Avenue, Tomsk, 634050, Russia

2Laboratory of Plasma Sources, Institute of High Current Electronics SB RAS, 2/3 Academichesky Ave., Tomsk, 634055, Russia

Adv. Mater. Proc., 2019, 4 (2), AMP1401453

DOI: 10.5185/amp.2019.1453

Publication Date (Web):05 April 2019

Copyright © IAAM-VBRI Press

Abstract


Abstract

This paper presents a novel technique for producing alumina ceramic coatings based on the evaporation of an aluminum oxide target by an electron beam in the middle vacuum range (5-30 Pa). The evaporation of ceramics by the electron beam enables to attain a coating deposition rate of up to 0.3 µm/min, and thus consider this as a practical alternative to existing methods. A special attention is devoted to the study of the surfaces of obtained coatings. The X-ray fluorescence analysis of the deposited coating showed the presence in the coating of all the elements that contained in the ceramic target being evaporated. The coating has a substantially homogeneous surface without any prominent pores. Copyright © VBRI Press.

Keywords


Plasma, electron beam, fore-vacuum.