Glow discharge plasma polymerized nanostructured polyaniline thin film optical waveguide

Aviraj A. Jatratkar1, Jyotiprakash B. Yadav1*, R.R. Deshmukh2, Harish C. Barshilia3, Vijaya Puri4, R.K. Puri1*

1Department of USIC, Shivaji University, Kolhapur, Maharashtra, India

2Department of Physics, Institute of Chemical Technology, Mumbai, Maharashtra, India.

3Surface Engineering Division, CSIR- National Aerospace Laboratories, Bangalore, India

4Department of Physics, Shivaji University, Kolhapur, Maharashtra, India

Adv. Mater. Lett., 2017, 8 (2), pp 180-184

DOI: 10.5185/amlett.2017.6409

Publication Date (Web): Dec 27, 2016



In this work, glow discharge continuous wave plasma polymerization technique was used to deposit nanostructured polyaniline (PANI) thin film by varying input power. The radio frequency (RF) used for plasma polymerization was 13.56 MHz and working pressure was 0.15 mbar. It was found that, changes in the input power can be used to control the properties of the plasma polymerized PANI thin films. Highly cross-linked structure with an increase in chain length was observed from FTIR spectra with input RF power, whereas the film surface morphology was found to be highly uniform, densely packed and smooth from FE-SEM images. The surface roughness of the film was found to increase with RF power. The refractive index and adhesion of the film was found to be increased while the optical band gap and surface energy decreased with input RF power. The plasma polymerized PANI film showed outstanding optical transmission loss properties and proved itself as excellent optical waveguide. 


Polyaniline, plasma polymerization, optical waveguide.

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