Structural properties of Fe doped TiO2 films on LaAlO3 and Si substrates

Komal Bapna, R.J. Choudhary*, D.M. Phase

UGC-DAE Consortium for Scientific Research, Khandwa Road, Indore 452001, India

Adv. Mater. Lett., 2011, 2 (4), pp 281-284

DOI: 10.5185/amlett.indias.205

Publication Date (Web): Apr 08, 2012

E-mail: ram@csr.res.in

Abstract


We have prepared 4 at.% Fe doped TiO2 thin films on LAO (001) and Si (111) substrates by pulsed laser deposition. X-ray diffraction (XRD) studies suggest different structural properties of the films on the different substrates. Raman measurements corroborate the XRD findings. The thicknesses of the films are also different on the two substrates, suggesting different nucleation process on the two substrates. Interestingly on both the substrates, Fe is not in metal clusters, suggesting their possible incorporation in TiO2 matrix.

Keywords

Thin film, doped TiO2, pulsed laser deposition, X-ray diffraction, DMS

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