Enhanced Optical Absorbance Of Hydrophobic Ti Thin Film: Role Of Surface Roughness

Jyoti Jaiswal1, Amit Sanger1, Ashwani Kumar1, Satyendra Mourya1, Samta Chauhan1, Ritu Daipuriya2, Manpreet Singh2 and Ramesh Chandra1*

1Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667, India

2Photonics Division, Terminal Ballistics Research Laboratory, Chandigarh 160030, India

Adv. Mater. Lett., 2016, 7 (6), pp 485-490

DOI: 10.5185/amlett.2016.6056

Publication Date (Web): May 30, 2016

E-mail: ramesfic@iitr.ac.in

Abstract


In the present work, structural, morphological, optical and wettability properties of DC magnetron sputtered titanium (Ti) thin films have been investigated. The nanostructured Ti thin films were deposited on glass and silicon substrates at various deposition angles, θD = 0°, 30°, 45° and 60°. HCP structure of Ti thin films with preferred peak orientations (100) and (002) were revealed from XRD. It was observed that as the deposition angle increases, film thickness (~260 - 100 nm) as well as average crystallite size (~27 - 11 nm) of Ti thin films decrease. Significant changes in topography of the films, with change in deposition angle, have been observed. The optical and wettability results suggested that transmission, reflection, absorption and water contact angle of Ti thin films are strongly influenced by deposition angle due to change in its surface roughness. The large near infrared (NIR) absorbance (~ 66 - 75%) was found for the sample deposited at θD = 30°, which exhibited hydrophobic (~ 94.6°) nature with high surface roughness (~ 28 nm). 

Keywords

Ti thin films, sputtering, surface roughness, NIR absorbance, hydrophobicity

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