Atmospheric Pressure Chemical Vapor Deposition Of Amorphous Tungsten Doped Vanadium Dioxide For smart Window Applications  

Dimitrios Louloudakis1, 2*, Dimitra Vernardou1, Emmanuel Spanakis3, Mirela Suchea4, George Kenanakis5, Martyn Pemble6, Konstantinos Savvakis1, 7, Nikolaos Katsarakis1, 4, 5, Emmanuel Koudoumas1, 4, George Kiriakidis2, 5

1Center of Materials Technology & Photonics, School of Applied Technology, Technological Educational Institute of Crete, Heraklion 71004, Crete, Greece

2Department of Physics, University of Crete, Heraklion 71100, Crete, Greece

3Department of Materials Science & Technology, University of Crete, Heraklion 71100, Crete, Greece

4Department of Electrical Engineering, School of Applied Technology, Technological Educational Institute of Crete,Heraklion 71004, Crete, Greece

5Institute of Electronic Structure & Laser, Foundation for Research & Technology- Hellas, P.O. Box 1527, Vassilika Vouton, Heraklion 71110, Crete, Greece

6Tyndall National Institute, University College Cork, Lee Maltings, Prospect Row, Cork, Ireland

7Mechanical Engineering Department, School of Applied Technology,Technological Educational Institute of Crete, Heraklion 71004, Crete, Greece

Adv. Mater. Lett., 2016, 7 (3), pp 192-196

DOI: 10.5185/amlett.2016.6024

Publication Date (Web): Feb 01, 2016

E-mail: dimitr17@yahoo.gr

Abstract


Amorphous tungsten doped vanadium dioxide coatings were grown on SnO2-precoated glass substrates using the atmospheric pressure chemical vapor deposition of vanadium (V) triisopropoxide and tungsten (VI) isopropoxide at 450 oC without an oxygen source. The effect of N2 flow rate through the tungsten’s precursor bubbler was examined keeping the respective flow rate through the vanadium’s precursor bubbler at 4 L min-1 for a growth period of 30 min. They were characterized by x-ray diffraction, Raman and x-ray photoelectron spectroscopy, field-emission scanning electron microscopy and UV-vis/IR transmittance. The samples grown using 0.4 L min-1 N2 flow rate through the tungsten precursor’s bubbler, showed the greatest reduction in transition temperature from 65.5 in granular VO2 to 44 oC in worm-like V0.985W0.015O2 structures approaching that required for commercial use as a smart window coating. 

Keywords

APCVD, tungsten doped vanadium dioxide, thermochromic material.

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