Crystal Structure And Thermal Studies Of Copper(II) And Nickel(II) Complexes Of 2-hydroxyacetophenoimine As Vapour Precursors

V. Jeseentharani1, J. Selvakumar2, Babu Varghese3, A. Dayalan1, K. S. Nagaraja1

1Department of Chemistry, Loyola Institute of Frontier Energy (LIFE), Loyola College, Chennai 600034, India

2Powder Metallurgy Division, Materials Group, Bhabha Atomic Research Centre, Navi Mumbai 400703, India

3Sophisticated Instrumentation for Analytical Facility (SAIF), Indian Institute of Technology-Madras (IITM), Chennai 600036, India

Adv. Mater. Lett., 2013, Current Issue, 4 (8), pp 643-649

DOI: 10.5185/amlett.2012.11462

Publication Date (Web): Jul 13, 2013

E-mail: jeseentha@gmail.com, dr.ksnagaraja@gmail.com

Abstract


Schiff’s base complexes bis(2-hydroxyacetophenoimine)nickel(II) [Ni(ohapim)2] and bis(2-hydroxyacetophenoimine)copper(II) [Cu(ohapim)2] were synthesized and studied for their idealist novel vapour source for chemical vapour deposition (CVD) application. Molecular structure was determined using single crystal X-ray diffraction, FT-IR, and elemental (C, H, N, and O) studies. Upon screening these complexes by dynamic thermogravimetric (TG) analyses, [Ni(ohapim)2] was found to be completely volatile and suitable for Ni/NiO CVD application. The temperature-dependent vapour pressure of [Ni(ohapim)2] was measured by using a transpiration apparatus and gave a value of 77.4 ± 0.8 kJ/mol for the enthalpy of sublimation (ΔH°sub) in the temperature range 527.86–584.22 K.

Keywords

Schiff’s base complexes, single crystal, volatility, vapour pressure, CVD precursors

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