Hybrid Physical Chemical Vapour Deposition (HPCVD) of Superconducting MgB2 Thin Films on three Dimensional Copper Substrates Hybrid Physical Chemical Vapour Deposition (HPCVD) of Superconducting MgB2 Thin Films on three Dimensional Copper Substrates
1Radiation Technology Development Division, Bhabha Atomic Research Centre, Mumbai 400085, India
2ASTEC, Daresbury Laboratory, Science and Technology Facilities Council, Warrington, WA44AD, United Kingdom
Adv. Mater. Lett., 2020, 11 (11), 20111574
Publication Date (Web): Oct 19, 2020
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The present work reports the design, development and application of a novel Hybrid Physical Chemical Vapour Deposition (HPCVD) technique for depositing MgB2 thin films, with potential superconductivity, directly on three dimensional (3D) surfaces. A novel solenoid magnetron based set up was used for depositing MgB2 thin films on 3D surfaces of Cu tube. Mg rod was used as the sputter target and source of Mg while high purity BBr3 was used as a novel boron precursor, which was injected into the system using Argon as carrier gas. The plasma mediated decomposition of BBr3 in presence of H2 gas was followed by chemical reaction between Mg and B atoms to deposit MgB2 film on the substrate. Samples were characterized by SEM, EDX, XRD and SQUID techniques. SEM-EDX confirmed deposition of a homogeneous, pore free and dense MgB2 film, while XRD analysis revealed the film to be polycrystalline and multiphasic rather than being purely c-axis oriented. Superconductivity analysis carried out using SQUID measurements indicated a sharp transition with Tc value of 39 K. From the M-H hysteresis loop, the lower critical field Hc1 and critical current density Jc at 4.2 K were calculated to be 700 Oe and 3.5 x 107 A/cm2, respectively.
Hybrid physical chemical vapour deposition, BBr3, MgB2 film, superconductivity.