Functional Bi Coatings as A Perspective Material for Radiation Shields Production against Electron Radiation

Daria I. Tishkevich1,2*, Sergey S. Grabchikov1, Stanislav B. Lastovskii1, Dzmitry V. Yakimchuk1, Denis A. Vinnik2, Alla I. Vorobjova3, Tatiana I. Zubar1,2, Alex V. Trukhanov1,2

1Laboratory of Magnetic Films Physics, Laboratory of Radiation Influences, Division of Cryogenic Research, SSPA “Scientific-Practical Materials Research Centre of NAS of Belarus”, P. Brovki str. 19, Minsk, 220072, Belarus

2Laboratory of Single Crystal Growth, South Ural State University, Lenin ave. 76, Chelyabinsk, 454080, Russia

3Laboratory of Hybrid Microcircuit Technology, Belarusian State University of Informatics and Radioelectronics, P. Brovki str. 6, Minsk, 220013, Belarus

Adv. Mater. Lett., 2020, 11 (2), 20021479

DOI: 10.5185/amlett.2020.021479

Publication Date (Web): Dec 07, 2019

E-mail: dashachushkova@gmail.com

Abstract


Currently, medicine uses a large number of devices and sources of ionizing radiation, which have a dangerous effect on workers in medical diagnostic rooms and patients. Human organs are very sensitive to the damaging effects of radiation. The commonly used material for radiation protection proposes is lead. In recent years, bismuth deposition has become an interesting subject for the electrochemical community because of its unique properties. There are a limited number of authors dealing with Bi films onto metallic substrates by electrochemical deposition. The conditions of Bi electrodeposition and the structure of Bi coatings were examined. The shielding efficiency of Bi coatings under electron irradiation with 1,6–1,8 MeV was measured. The electron beam attenuation coefficient was estimated by the changing of current-voltage characteristics of semiconductor test structures which were located with and without shields. It has been determined that optimal shielding efficiency and mass-dimensional parameters have Bi shields with 2 g/cm2 mass thickness and 156 shielding efficiency.

 

Keywords

Electrochemical deposition, bismuth, shielding, electron radiation, semiconductor structures.

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