Effect of the substrate bias in diamond deposition during hot filament chemical vapor deposition: Approach by non-classical crystallization 

Jin-Woo Park1, Kwang-Ho Kim2, 3, Nong-Moon Hwang1*, 3

1Department of Materials Science and Engineering, Seoul National University, 1 Gwanak-ro, Gwanak-gu, Seoul 08826, Korea

2School of Materials Science and Engineering, Pusan National University, Busan 46241, Korea

3Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan 46241, Korea

Adv. Mater. Lett., 2018, 9 (9), pp 638-642

DOI: 10.5185/amlett.2018.2082

Publication Date (Web): Jun 14, 2018

E-mail: nmhwang@snu.ac.kr

Abstract


The effect of the substrate bias on the diamond deposition was studied using a hot filament chemical vapor deposition (HFCVD) reactor. Both growth rate of diamonds and sp3/sp2 ratio increased with increasing the substrate bias from – 200 V to + 45 V. At + 60 V where the DC glow discharge occurred, however, the data deviated significantly from the tendency. These results were explained by the new concept of non-classical crystallization, where a building block of diamond growth is a charged nanoparticle rather than an atom. Based on the previously reported experimental confirmation of the gas phase generation of negatively-charged diamond nanoparticles, the bias effect on the diamond deposition behavior could be consistently explained.

Keywords

Bias, diamond film, nanoparticles, hot filament cvd, microstructure.

Upcoming Congress

Knowledge Experience at Sea TM