Institute of Solid State Physics, NAWI Graz, Graz University of Technology, Petersgasse 16, 8010 Graz, Austria
Adv. Mater. Lett., 2017, 8 (5), pp 578-586
Publication Date (Web): Apr 04, 2017
Copyright © IAAM-VBRI Press
Functional organic thin films (< 100 nm) are typical components of current devices in a variety of fields, including microelectronics, biotechnology and microfluidics. The need for miniaturization and structuration has boosted the development of advanced thin film growth techniques that can be easily implemented in the manufacturing steps of current device production. This review aims at presenting the latest progresses made in the field of chemical vapor deposition (CVD) methods of organic thin films. In CVD processes, the chemicals are delivered through the vapor-phase to the substrate, without the use of solvents, with the advantage of enlarging the applicability of polymer thin films to fields where the presence of solvent is detrimental. Among other methods, the initiated Chemical Vapor Deposition (iCVD) will be reviewed. High control over chemical composition, structure and film functionality has been largely demonstrated by iCVD. This technique allows coating virtually any substrate with conformal polymers at very low energy consumption. The specific chemical composition and the nanoengineered thickness control are desirable parameters for driving application-specific properties into the material. Further development of this field will certainly lead to progresses on the use of polymers in functional devices, as electrolytes, stimuli-responsive materials, encapsulants for drug-delivery and as membranes or barriers for permeation.
Chemical vapor deposition, functional thin film, polymer coatings.