UGC-DAE Consortium for Scientific Research, Khandwa Road, Indore 452001, India
Adv. Mater. Lett., 2011, 2 (4), pp 281-284
Publication Date (Web): Apr 08, 2012
Copyright © IAAM-VBRI Press
We have prepared 4 at.% Fe doped TiO2 thin films on LAO (001) and Si (111) substrates by pulsed laser deposition. X-ray diffraction (XRD) studies suggest different structural properties of the films on the different substrates. Raman measurements corroborate the XRD findings. The thicknesses of the films are also different on the two substrates, suggesting different nucleation process on the two substrates. Interestingly on both the substrates, Fe is not in metal clusters, suggesting their possible incorporation in TiO2 matrix.
Thin film, doped TiO2, pulsed laser deposition, X-ray diffraction, DMS