Atmospheric pressure chemical vapor deposition of amorphous tungsten doped vanadium dioxide for smar
1Center of Materials Technology & Photonics, School of Applied Technology, Technological Educational Institute of Crete, Heraklion 71004, Crete, Greece
2Department of Physics, University of Crete, Heraklion 71100, Crete, Greece
3Department of Materials Science & Technology, University of Crete, Heraklion 71100, Crete, Greece
4Department of Electrical Engineering, School of Applied Technology, Technological Educational Institute of Crete,Heraklion 71004, Crete, Greece
5Institute of Electronic Structure & Laser, Foundation for Research & Technology- Hellas, P.O. Box 1527, Vassilika Vouton, Heraklion 71110, Crete, Greece
6Tyndall National Institute, University College Cork, Lee Maltings, Prospect Row, Cork, Ireland
7Mechanical Engineering Department, School of Applied Technology,Technological Educational Institute of Crete, Heraklion 71004, Crete, Greece
Adv. Mater. Lett., 2016, 7 (3), pp 192-196
Publication Date (Web): Feb 01, 2016
Copyright © IAAM-VBRI Press
Amorphous tungsten doped vanadium dioxide coatings were grown on SnO2-precoated glass substrates using the atmospheric pressure chemical vapor deposition of vanadium (V) triisopropoxide and tungsten (VI) isopropoxide at 450 oC without an oxygen source. The effect of N2 flow rate through the tungsten’s precursor bubbler was examined keeping the respective flow rate through the vanadium’s precursor bubbler at 4 L min-1 for a growth period of 30 min. They were characterized by x-ray diffraction, Raman and x-ray photoelectron spectroscopy, field-emission scanning electron microscopy and UV-vis/IR transmittance. The samples grown using 0.4 L min-1 N2 flow rate through the tungsten precursor’s bubbler, showed the greatest reduction in transition temperature from 65.5 in granular VO2 to 44 oC in worm-like V0.985W0.015O2 structures approaching that required for commercial use as a smart window coating.
APCVD, tungsten doped vanadium dioxide, thermochromic material.