1Department of Chemistry, Loyola Institute of Frontier Energy (LIFE), Loyola College, Chennai 600034, India
2Powder Metallurgy Division, Materials Group, Bhabha Atomic Research Centre, Navi Mumbai 400703, India
3Sophisticated Instrumentation for Analytical Facility (SAIF), Indian Institute of Technology-Madras (IITM), Chennai 600036, India
Adv. Mater. Lett., 2013, Current Issue, 4 (8), pp 643-649
DOI: 10.5185/amlett.2012.11462
Publication Date (Web): Jul 13, 2013
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E-mail: jeseentha@gmail.com, dr.ksnagaraja@gmail.com
Schiff’s base complexes bis(2-hydroxyacetophenoimine)nickel(II) [Ni(ohapim)2] and bis(2-hydroxyacetophenoimine)copper(II) [Cu(ohapim)2] were synthesized and studied for their idealist novel vapour source for chemical vapour deposition (CVD) application. Molecular structure was determined using single crystal X-ray diffraction, FT-IR, and elemental (C, H, N, and O) studies. Upon screening these complexes by dynamic thermogravimetric (TG) analyses, [Ni(ohapim)2] was found to be completely volatile and suitable for Ni/NiO CVD application. The temperature-dependent vapour pressure of [Ni(ohapim)2] was measured by using a transpiration apparatus and gave a value of 77.4 ± 0.8 kJ/mol for the enthalpy of sublimation (ΔH°sub) in the temperature range 527.86–584.22 K.
Schiff’s base complexes, single crystal, volatility, vapour pressure, CVD precursors
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