1Nanostech Laboratory, Department of Physics, Indian Institute of Technology, Delhi, New Delhi 110016, India
2Institute of Physics, University of São Paulo, São Paulo 05508-090, Brazil
3Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India
4Sincrotrone Trieste S.C.p.A. di interesse nazionale, Trieste, Italy
Adv. Mater. Lett., 2013, Ion Beam Special Issue, 4 (6), pp 390-397
Publication Date (Web): Mar 16, 2013
Copyright © IAAM-VBRI Press
A series of FeCo-SiO2 granular films of different FeCo atomic concentration (33-54%) have been prepared by fast atom beam sputtering technique and post-annealed in inert (Ar) and reducing (H2) gas environments. Fe and Co K-edge XANES analysis of as-deposited films indicate that both Fe and Co are present mainly in their elemental (Fe0, Co0) state. A partial oxidation of Fe and Co is observed, as the FeCo alloy content decreases (54 to 33%) due to reduced particle size. XANES/XAFS analysis shows the formation of FeCo alloy with bcc Fe structure in H2 environment annealed films. The XRD and Raman analysis of Ar environment annealed films suggest the formation of Co3O4 and CoFe2O4 phases. The Ar environment is found not to be effective reducing medium to stabilize the FeCo alloy phase, while H2 environment annealing (450-700 oC) leads to formation of bcc FeCo alloy.
Nanocomposite, fast atom beam sputtering technique, XANES analysis, XRD and Raman analysis.