Effect of deposition temperature on the electrochromic properties of WO3 grown by LPCVD

D. Louloudakis1*, D. Vernardou1, 2, G. Papadimitropoulos3, D. Davazoglou3 and E. Koudoumas1, 2 

1Center of Materials Technology and Photonics, School of Engineering, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece

2Department of Electrical Engineering, School of Engineering, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece

3NCSR “Demokritos”, Institute of Nanoscience and Nanotechnology, P.O. Box 60228, 15310 Agia Paraskevi, Athens, Greece

Adv. Mater. Lett., 2018, 9 (3), pp 192-198

DOI: 10.5185/amlett.2018.1823

Publication Date (Web): May 16, 2018

E-mail: dimitr17@yahoo.gr

Abstract


Monoclinic electrochromic tungsten trioxide (WO3) layers were grown on FTO substrates using a Low-Pressure Chemical Vapor Deposition (LPCVD) system. The effect of the deposition temperature on the structural and morphological characteristics as well as the electrochromic response of the layers was examined. It was found that increasing deposition temperature improves the crystallinity of the layers which affects their electrochemical/electrochromic behavior. 

Keywords

LPCVD, tungsten trioxide, electrochromic response.

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